Search results for "Photolithography"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
94	Peter J. Byrne, Cathal Heavey, Kamil Erkan Kabak	An analysis of tool capabilities in the photolithography area of an ASIC fab.	WSC	2007	DBLP DOI BibTeX RDF
88	Arthur M. D. Shr, Alan Liu, Peter P. Chen	A Heuristic Load Balancing Scheduling Method for Dedicated Machine Constraint.	IEA/AIE	2006	DBLP DOI BibTeX RDF
65	Peter J. Byrne	An analysis of semiconductor reticle management using discrete event simulation.	SCSC	2007	DBLP BibTeX RDF	photolithography, reticle management, decision support systems, discrete event simulation
59	Lars Mönch, Matthias Prause, Volker Schmalfuss	Simulation-based solution of load-balancing problems in the photolithography area of a semiconductor wafer fabrication facility.	WSC	2001	DBLP DOI BibTeX RDF
47	Huy Nguyen Anh Pham, Arthur M. D. Shr, Peter P. Chen	An Integer Linear Programming Approach for Dedicated Machine Constraint.	ACIS-ICIS	2008	DBLP DOI BibTeX RDF	Dedicated Machine Constraint, Photolithography, Integer Linear Programming, Semiconductor Manufacturing
41	Kamil Erkan Kabak, Cathal Heavey, Vincent Corbett	Analysis of multiple process flows in an ASIC fab with a detailed photolithography area model.	WSC	2008	DBLP DOI BibTeX RDF
35	Jessica E. Rajkowski, Aaron P. Gerratt, Ethan W. Schaler, Sarah Bergbreiter	A multi-material milli-robot prototyping process.	IROS	2009	DBLP DOI BibTeX RDF
35	Sandip Kundu	The Guiding Light for Chip Testing.	DDECS	2008	DBLP DOI BibTeX RDF
35	Yoko Yamanishi, Shinya Sakuma, Yuki Kihara, Fumihito Arai	On-chip magnetic 3D soft microactuators made by gray-scale lithography.	IROS	2008	DBLP DOI BibTeX RDF
35	Huy Nguyen Anh Pham, Arthur M. D. Shr, Peter P. Chen, Alan Liu	Scheduling for Dedicated Machine Constraint Using Integer Programming.	ICTAI (1)	2008	DBLP DOI BibTeX RDF
35	Yi-Chung Lo, Yuan-Hsun Wu, Chia-Sheng Huang, Hong-Wen Liu, Chi-Hung Lin, Jengping Lin, Wensyang Hsu, Chaoen Wang	Sub-Microfabrication of Protein Micropatterns for Cell Biology Applications.	ICMENS	2004	DBLP DOI BibTeX RDF
35	Anne M. Murray, David J. Miller 0004	Automated material handling systems: automated reticle handling: a comparison of distributed and centralized reticle storage and transport.	WSC	2003	DBLP DOI BibTeX RDF
29	Vipul Singhal, C. B. Keshav, K. G. Surnanth, P. R. Suresh	Transistor Flaring in Deep Submicron-Design Considerations.	ASP-DAC/VLSI Design	2002	DBLP DOI BibTeX RDF	Deep Submicron (DSM), pullback, photolithography, Subwavelength-lithography, Optical Proximity Correction (OPC), SPICE-models, standard-ce1l library, Design for Manufacturability (DFM)
29	H. Keith Nishihara, P. A. Crossley	Measuring Photolithographic Overlay Accuracy and Critical Dimensions by Correlating Binarized Laplacian of Gaussian Convolutions.	IEEE Trans. Pattern Anal. Mach. Intell.	1988	DBLP DOI BibTeX RDF	positioning accuracy measurement, convolution correlation, picture element clusters, resist alignment, photolithographic overlay accuracy, critical dimensions, binarized Laplacian of Gaussian convolutions, IC manufacture, interference fringes, edge topology differences, low-contrast images, bar grating, integrated circuit technology, photolithography, pattern recognition, computer vision, computer vision, computerised pattern recognition, feature matching, Laplace transforms, noise tolerance
23	Youbao Zhang, Huijie Huang	Photolithography Control System : A Case Study For Cyber-Physical System.	CoRR	2024	DBLP DOI BibTeX RDF
23	Aris Magklaras 0001, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, Alexios N. Birbas	A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography.	Inf.	2023	DBLP DOI BibTeX RDF
23	Cheng Zheng, Guangyuan Zhao, Peter T. C. So	Neural Lithography: Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Photolithography Simulator.	CoRR	2023	DBLP DOI BibTeX RDF
23	Xiaojiang Liu, Gaoqiang Niu, Jin Li, Yi Zhuang, Xitong Sun, Fei Wang	MEMS Gas Sensors with Metal-Oxide Semiconductor Materials Patterned at Wafer-Level by Photolithography Technique.	SENSORS	2023	DBLP DOI BibTeX RDF
23	Tao Zhang 0044, Kamil Erkan Kabak, Cathal Heavey, Oliver Rose	A Reinforcement Learning Approach for Improved Photolithography Schedules.	WSC	2023	DBLP DOI BibTeX RDF
23	Yanli Li, Xianhe Liu, Qi Wang, Qiang Wu	A Further Analysis of the Forbidden Pitch in Photolithography in Advanced Technology Nodes.	ASICON	2023	DBLP DOI BibTeX RDF
23	Tianwei Wu, Xueqiu You, Zhong Chen 0005	Hollow Microneedles on a Paper Fabricated by Standard Photolithography for the Screening Test of Prediabetes.	Sensors	2022	DBLP DOI BibTeX RDF
23	Patrick C. Deenen, Rick A. M. Adriaensen, John W. Fowler	Building a Digital Twin of the Photolithography Area of A Real-World Wafer FAB To Validate Improved Production Control.	WSC	2022	DBLP DOI BibTeX RDF
23	Aris Magklaras 0001, Christos Gogos, Panagiotis Alefragis, Christos Valouxis, Alexios N. Birbas	Sampling Points Selection Algorithm For Advanced Photolithography Process.	SEEDA-CECNSM	2022	DBLP DOI BibTeX RDF
23	Ibrahem Jasim, Jiayu Liu, Chen Zhu, Muhammad Roman, Jie Huang 0003, Edward C. Kinzel, Mahmoud Almasri	Microsphere Photolithography Patterned Nanohole Array on an Optical Fiber.	IEEE Access	2021	DBLP DOI BibTeX RDF
23	Zhian Kuang, Liting Sun, Huijun Gao, Masayoshi Tomizuka	Practical Fractional-Order Variable-Gain Super-Twisting Control with Application to Wafer Stages of Photolithography Systems.	CoRR	2021	DBLP BibTeX RDF
23	Amir Ghasemi, Cathal Heavey	An Evaluation of Strategies for Job Mix Selection in Job Shop Production Environments - Case: A Photolithography Workstation.	WSC	2021	DBLP DOI BibTeX RDF
23	Luhua Xu, Deng Mao, Jinsong Zhang, Yun Wang, Zhenping Xing, Md Samiul Alam, Maxime Jacques, Yannick D'Mello, Santiago Bernal, David V. Plant	Broadband Polarization Beam Splitters Based on MMI Couplers with Internal Photonic Crystals Fabricated Using 193 nm Photolithography.	OFC	2021	DBLP BibTeX RDF
23	Andrei Ushkov, Olivier Delléa, Isabelle Verrier, Thomas Kampfe, Alexey A. Shcherbakov, Jean-Yves Michalon, Yves Jourlin	Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission.	PHOTOPTICS	2021	DBLP DOI BibTeX RDF
23	Yingying Dou, Lin Chen, Hui Li 0043, Biao Tang, Alex Henzen, Guofu Zhou	Photolithography Fabricated Spacer Arrays Offering Mechanical Strengthening and Oil Motion Control in Electrowetting Displays.	Sensors	2020	DBLP DOI BibTeX RDF
23	James C. Chen, Tzu-Li Chen, Hsiao-Ching Hung	Capacity allocation with lot splitting in photolithography area using hybrid genetic algorithm based on self-tuning strategy.	Comput. Ind. Eng.	2020	DBLP DOI BibTeX RDF
23	Shigehiro Hashimoto, Kiyoshi Yoshinaka	Is Dielectrophoretic Movement through Micro Channel with Asymmetric Surface Electrodes Fabricated by Photolithography Technique Effective to Sort Flowing Cell?	BIBE	2020	DBLP DOI BibTeX RDF
23	Shigehiro Hashimoto, Kazuyuki Abe	Monitoring of Orientation of Cells by Electric Impedance: Test on Oriented Cells Using Micro Striped Grooves Pattern by Photolithography.	BIBE	2019	DBLP DOI BibTeX RDF
23	Hyeong-Ook Kim, Se-Hyeon Park, Jung Yeon Park, James R. Morrison	On the Consequences of Un-Modeled Dynamics to the Optimality of Schedules in Clustered Photolithography Tools.	WSC	2019	DBLP DOI BibTeX RDF
23	Oluwayemisi Sonoiki	Photolithography and surface modification applications of a 172 nanometer xenon microplasma excilamp		2019	RDF
23	Teun Janssen	Optimization in the Photolithography Bay: Scheduling and the Traveling Salesman Problem.		2019	RDF
23	Peng Zhang, Youlong Lv, Jie Zhang 0041	An improved imperialist competitive algorithm based photolithography machines scheduling.	Int. J. Prod. Res.	2018	DBLP DOI BibTeX RDF
23	Peng Zhang 0049, Xinming Zhao, Xia Sheng, Jie Zhang 0041	An Imperialist Competitive Algorithm Incorporating Remaining Cycle Time Prediction for Photolithography Machines Scheduling.	IEEE Access	2018	DBLP DOI BibTeX RDF
23	Neam Heng Lee, Jian Zhen Tay, Varghese Swamy, Narayanan Ramakrishnan	Smartphone Display Based Photolithography to Fabricate Microdevices.	IEEE Access	2018	DBLP DOI BibTeX RDF
23	Sreenath Chalil Madathil, Siddhartha Nambiar, Scott J. Mason, Mary E. Kurz	On scheduling a photolithography area containing cluster tools.	Comput. Ind. Eng.	2018	DBLP DOI BibTeX RDF
23	Tzu-Yen Hong, Chen-Fu Chien 0001, Hung-Kai Wang, Hong-Zhi Guo	A two-phase decoding genetic algorithm for TFT-LCD array photolithography stage scheduling problem with constrained waiting time.	Comput. Ind. Eng.	2018	DBLP DOI BibTeX RDF
23	Amir Ghasemi, Cathal Heavey, Kamil Erkan Kabak	Implementing a New Genetic Algorithm to solve the Capacity Allocation Problem in the photolithography Area.	WSC	2018	DBLP DOI BibTeX RDF
23	Hsuan An Kuo, Chen Fu Chien 0001	Using Auxiliary Capacity Planning Strategy Genetic Algorithm for TFT-LCD photolithography scheduling to empower Industry 3.5.	CASE	2018	DBLP DOI BibTeX RDF
23	Nurul Ashikin Binti Daud, Yuta Ooka, Tomohisa Tabata, Tomohiro Tetsumoto, Takasumi Tanabe	Electro-Optic Modulator Based on Photolithography Fabricated p-i-n Integrated Photonic Crystal Nanocavity.	IEICE Trans. Electron.	2017	DBLP DOI BibTeX RDF
23	Luca Rondi, Fadil Santosa, Zhu Wang 0003	A Variational Approach to the Inverse Photolithography Problem.	SIAM J. Appl. Math.	2016	DBLP DOI BibTeX RDF
23	Katsuo Nakamura, Yoshikazu Hirai, Toshiyuki Tsuchiya, Osamu Tabata, Florian Larramendy, Oliver Paul	Simulation study of SU-8 structures realized by single-step projection photolithography.	IEEE SENSORS	2016	DBLP DOI BibTeX RDF
23	Patrick Dumais, Yuming Wei, Ming Li, Fei Zhao, Xin Tu, Jia Jiang, Dritan Celo, Dominic J. Goodwill, Hongyan Fu 0001, Dongyu Geng, Eric Bernier	2×2 multimode interference coupler with low loss using 248 nm photolithography.	OFC	2016	DBLP BibTeX RDF
23	Masanori Iwata, Kenji Miyake, Nobuyoshi Yamauchi, Junko Kazusa	Blue GaN based LED fabrication using hybrid process of the minimal photolithography system and MOCVD.	ICICDT	2016	DBLP DOI BibTeX RDF
23	Terence Sweeney, Kevin Curran	The detection of empty resist bottles or air in the resist lines of a photolithography coating tool.	Int. J. Comput. Integr. Manuf.	2015	DBLP DOI BibTeX RDF
23	Bing-Hai Zhou, Xin Li 0030, Richard Y. K. Fung	Dynamic scheduling of photolithography process based on Kohonen neural network.	J. Intell. Manuf.	2015	DBLP DOI BibTeX RDF
23	Kyungsu Park, James R. Morrison	Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic.	IEEE Trans Autom. Sci. Eng.	2015	DBLP DOI BibTeX RDF
23	Kyosuke Muramatsu, Hideaki Asakura, Keijiro Suzuki, Ken Tanizawa, Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino, Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima, Hiroyuki Tsuda	Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography.	IEICE Electron. Express	2015	DBLP DOI BibTeX RDF
23	Wen-Chin Chen, Xiao-Yun Jiang, Hui-Pin Chang, Hisa-Ping Chen	An effective system for parameter optimization in photolithography process of a LGP stamper.	Neural Comput. Appl.	2014	DBLP DOI BibTeX RDF
23	Rodrigo Martinez-Duarte	SU-8 Photolithography as a Toolbox for Carbon MEMS.	Micromachines	2014	DBLP DOI BibTeX RDF
23	Kyung-Hak Choi, Jinwoo Huh, Yonghao Cui, Krutarth Trivedi, Walter Hu, Byeong-Kwon Ju, Jeong-Bong Lee	One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer.	Micromachines	2014	DBLP DOI BibTeX RDF
23	Abdoul Bitar, Stéphane Dauzère-Pérès, Claude Yugma	On the importance of optimizing in scheduling: the photolithography workstation.	WSC	2014	DBLP DOI BibTeX RDF
23	Wen-Yi Lin, Wen-Bin Wu, K. C. Cheng, Hsin Hung Li	Photolithography for Thin-Film-Transistor Liquid Crystal Displays.	Handbook of Visual Display Technology	2012	DBLP DOI BibTeX RDF
23	Li-Yuan Yen, Kuo-Hao Chang	Cycle time reduction for photolithography area with multi-workstation.	CSCWD	2012	DBLP DOI BibTeX RDF
23	Jhih-Nan Yan, Yung-Chun Lee	Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate.	NEMS	2012	DBLP DOI BibTeX RDF
23	Yi-Ta Hsieh, Yung-Chun Lee	Metal contact printing photolithography for fabricating sub-micrometer patterned sapphire substrates in light-emitting diodes.	NEMS	2012	DBLP DOI BibTeX RDF
23	Kuo-Feng Huang, Sung-Wen Tsai, Yung-Chun Lee	Fabrication metal roller mold with sub-micrometer feature size based on contact printing photolithography.	NEMS	2012	DBLP DOI BibTeX RDF
23	Lin Li 0008, Xiaowen Liu, Andrew J. Mason	Die-level photolithography and etchless parylene packaging processes for on-CMOS electrochemical biosensors.	ISCAS	2012	DBLP DOI BibTeX RDF
23	James R. Morrison	On the fidelity of the ax+b equipment model for clustered photolithography scanners in fab-level simulation.	WSC	2011	DBLP DOI BibTeX RDF
23	Hao Lv, Shiyuan Liu, Peng Zhang, Zirong Tang	Fabrication of biomimetic gecko setae by direct photolithography and micromolding processes.	NEMS	2011	DBLP DOI BibTeX RDF
23	Wen-Hui Li, Hong-Wei Chen, Ya-Wen Hu, Yung-Chun Lee, Fei-Bin Hsiao	Fabrication of seamless roller molds using step-and-rotate curved surface photolithography and application on micro-lens array optic film.	NEMS	2011	DBLP DOI BibTeX RDF
23	Hyun-Jin Kim, Kwang-Jae Kim, Doh-Soon Kwak	A case study on modeling and optimizing photolithography stage of semiconductor fabrication process.	Qual. Reliab. Eng. Int.	2010	DBLP DOI BibTeX RDF
23	Kazuyoshi Itoga, Jun Kobayashi, Masayuki Yamato, Teruo Okano	Development of Microfabrication Technology with Maskless Photolithography Device Using LCD Projector.	J. Robotics Mechatronics	2010	DBLP DOI BibTeX RDF
23	Andreas Klemmt, Jan Lange, Gerald Weigert, Frank Lehmann 0001, Jens Seyfert	A multistage mathematical programming based scheduling approach for the photolithography area in semiconductor manufacturing.	WSC	2010	DBLP DOI BibTeX RDF
23	Hong-Wei Chen, Yung-Chun Lee, Fei-Bin Hsiao	Fabrication of seamless patterns onto metal rollers by photolithography.	NEMS	2010	DBLP DOI BibTeX RDF
23	Lih-Shyang Chen, Young-Jinn Lay, Lian-Yong Lin, Jing-Jou Tang, Wen-Lin Cheng, Yu-Jen Lin	The 3D Display and Analysis of the Pattern of Photolithography.	ICCCI (1)	2010	DBLP DOI BibTeX RDF
23	Arthur M. D. Shr, Alan Liu, Peter P. Chen	Load Balancing Among Photolithography Machines in the Semiconductor Manufacturing System.	J. Inf. Sci. Eng.	2008	DBLP BibTeX RDF
23	Shu-Hsing Chung, Chun-Ying Huang, Amy H. I. Lee	Heuristic algorithms to solve the capacity allocation problem in photolithography area (CAPPA).	OR Spectr.	2008	DBLP DOI BibTeX RDF
23	James R. Morrison, Donald P. Martin	Performance evaluation of photolithography cluster tools.	OR Spectr.	2007	DBLP DOI BibTeX RDF
23	Fumihito Arai, Takuma Nakano, Mika Tada, Yu-Ching Lin, Seiichi Ikeda, Tomoyuki Uchida, Hiroyuki Oura, Toshio Fukuda, Takehisa Matsuda, Makoto Negoro	Fabrication of Cell-Adhesion Surface and Arteriole Model by Photolithography.	J. Robotics Mechatronics	2007	DBLP DOI BibTeX RDF
23	James R. Morrison, Maruthi Kumar Mutnuri	On the Throughput of Clustered Photolithography Tools: Wafer Advancement and Intrinsic Equipment Loss.	CASE	2007	DBLP DOI BibTeX RDF
23	Benoît Torbiéro, Marie-Laure Pourciel-Gouzy, Iryna Humenyuk, Jean-Baptiste Doucet, Augustin Martinez, Pierre Temple-Boyer	Mass patterning of polysiloxane layers using spin coating and photolithography techniques.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
23	Yung-Kuang Yang, Tsun-Ching Chang	Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
23	H.-Y. Kang, Amy H. I. Lee	Critical dimension control in photolithography based on the yield by a simulation program.	Microelectron. Reliab.	2006	DBLP DOI BibTeX RDF
23	D. Y. Sha, S. Y. Hsu, Z. H. Che 0001, C. H. Chen	A dispatching rule for photolithography scheduling with an on-line rework strategy.	Comput. Ind. Eng.	2006	DBLP DOI BibTeX RDF
23	F. Mert Sasoglu, Andrew J. Bohl, Bradley E. Layton	Microfabrication procedure of PDMS microbeam array using photolithography for laminin printing and piconewton force transduction on axons.	EMBC	2006	DBLP DOI BibTeX RDF
23	Arthur M. D. Shr, Alan Liu, Peter P. Chen	A Load Balancing Method for Dedicated Photolithography Machine Constraint.	BASYS	2006	DBLP DOI BibTeX RDF
23	Shu-Hsing Chung, Chun-Ying Huang, Amy Hsin-I Lee	Using Constraint Satisfaction Approach to Solve the Capacity Allocation Problem for Photolithography Area.	ICCSA (3)	2006	DBLP DOI BibTeX RDF
23	Yang-Kuao Kuo, Chuen-Guang Chao, Chi-Yuan Lin	Analysis of instability line width and white wall created by the photolithography process.	Microelectron. J.	2004	DBLP DOI BibTeX RDF
23	Wei Kang, Ziqiang John Mao	Adaptive modeling and H∞ control for photolithography manufacturing process.	ACC	2004	DBLP DOI BibTeX RDF
23	Wei Kang, Ziqiang John Mao	An adaptive model for the control of critical dimension in photolithography process.	CDC	2004	DBLP DOI BibTeX RDF
23	Amr Arisha, Paul Young	Intelligent Simulation-Based Lot Scheduling of Photolithography Toolsets in a Wafer Fabrication Facility.	WSC	2004	DBLP BibTeX RDF
23	Nirupama Nayani, Mansooreh Mollaghasemi	Validation and Verification of the Simulation Model of a Photolithography Process in Semiconductor Manufacturing.	WSC	1998	DBLP DOI BibTeX RDF
23	Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire	Advanced DUV photolithography in a pilot lineenvironment.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
23	Thomas C. McGuigan	Modeling the Lot Selection Process in Semiconductor Photolithography Processing.	WSC	1992	DBLP DOI BibTeX RDF
23	Teruo Matsuzawa, Akemi Moniwa, N. Hasegawa, Hideo Sunami	Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1987	DBLP DOI BibTeX RDF
23	Anne M. Spence, Douglas J. Welter	Capacity planning of a photolithography work cell in a wafer manufacturing line.	ICRA	1987	DBLP DOI BibTeX RDF
23	Terry Cline, Wendy Fong, Steven Rosenberg	An Expert Advisor for Photolithography.	IJCAI	1985	DBLP BibTeX RDF
23	Arthur G. Gross, J. Raamot, S. B. Watkins	Device photolithography: Computer systems for pattern generator control.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	Patrick G. Dowd, Morton J. Cowan, Peter E. Rosenfeld, A. Zacharias	Device photolithography: The primary pattern generator part iii-the control system.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	D. S. Alles, J. W. Elek, F. L. Howland, B. Nevis, R. J. Nielsen, W. A. Schlegel, J. G. Skinner, C. E. Stout	Device photolithography: The step-and-repeat camera.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	K. M. Poole	Device photolithography: The primary pattern generator introduction.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	Judith G. Brinsfield, Stephen Pardee	Device photolithography: The mask shop information system.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	F. R. Ashley, E. B. Murphy, H. J. Savard	Device photolithography: A computer controlled coordinate measuring machine.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	Barret Broyde	Device photolithography: Electron-sensitive materials.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	F. L. Howland, K. M. Poole	Device photolithography: An overview of the new mask-making system.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF
23	G. J. W. Kossyk, J. P. Laico, L. Rongved, J. W. Stafford	Device photolithography: The primary pattern generator part ii-mechanical design.	Bell Syst. Tech. J.	1970	DBLP DOI BibTeX RDF